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2887 |
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Design of a Precision Transfer Line for Dip-pen Nanolithography |
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Applications of Precision Engineering in Manufacturing |
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Design of a Precision Transfer Line for Dip-Pen Nanolithography
Alexander H. Slocum, Jr. and Martin L. Culpepper
Department of Mechanical Engineering
Laboratory for Manufacturing and Productivity
Massachusetts Institute of Technology, Cambridge, MA
In this paper we describe a precision indexing system that enables scalable probe-based nanofabrication of nm-level features en mass. This technology, roughly the size of a ‘bread box,’ makes it possible to realize a continuous process wherein one can rapidly process (i) long substrate webs or (ii) many individual chips that ride upon a long web or belt. The long substrate web/belt enters one side of the system, is processed within, then exits on the opposite side. This approach is important because it circumvents the need to use a large, expensive, high-speed precision motion stage that moves across a substrate during processing. Here we bring the substrate to/from the processing area via web transport/transfer. We envision this technology will (a) provide a means that engineers/scientists can use to transform nascent probe-based nanofabrication technology into practical high-volume nanomanufacturing and (b) enable mass probe-based processing/interrogation of biological specimens (e.g. stem cell) during large factorial experiments.
A material transport/transfer system provides coarse-motion indexing of the substrate within reach of a meso-scale HexFlex-enabled [1] writing system that performs fine-motion processing over the substrate between indexed positions. The belt/web-based transfer system utilizes kinematic couplings, flexure reduction transmissions and flexible linear scales that travel with the belt/substrate to improve the accuracy and repeatability of the writing process. The writing process is carried out via an array of 10 HexFlex flexure-based nanopositioning stages. Each HexFlex is equipped with closed-loop six-axis motion control and guides a 50,000 tip probe array that writes material onto the substrate. When writing of the local area is complete, the transport system indexes new substrate under the HexFlex, the HexFlex registers the position/orientation of the new substrate, then self-recalibrates so that it may conduct nm-level processing of the substrate. The process then repeats.
The new technology will be demonstrated via a case study wherein the system is used to conduct a Dip Pen Nanolithography (DPN) writing process [2]. DPN is a unique probe-based nanofabrication process that enables engineers and scientists to write soft and hard materials onto a variety of substrates with feature sizes down to 15nm. While this technology is useful for applying materials to a large number of samples on individual chips (sample chips normally consist of an array of 55,000 samples over 1 cm2), it has not been possible to process large surfaces (~m2). We will demonstrate the design, modeling, optimization and characterization of the system’s accuracy/repeatability/stability as well as show early fabrication results.
[1] Golda, D., and Culpepper, M.L., “High–speed Meso–scale Six–axis Nanopositioner for Probe–based Nanomanufacturing," Proc. of the 4th International Symposium on Nanomanufacturing, November 1 – 3, 2006, Cambridge, MA, 171–6.
[2] Salaita, K., Wang, Y., Mirkin, C. A., “Application of Dip-Pen Nanolithography”, Nature, Nanotechnology, Vol. 2, pp. 145-155, March 2007.
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